1 January 2008 Nonlinear interferometric lithography for arbitrary two-dimensional patterns
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J. of Micro/Nanolithography, MEMS, and MOEMS, 7(1), 013004 (2008). doi:10.1117/1.2838591
Abstract
A new, relatively simple experimental technique for generating arbitrary, two-dimensional patterns with high visibility and higher resolution than allowed by the Rayleigh criterion has been developed. The theoretical and experimental details of the method, based on repeated phase-coherent interference of four beams on a multiphoton absorber, are described. A sample pattern generated by numerical computer simulation of the technique is also shown.
Sean J. Bentley, "Nonlinear interferometric lithography for arbitrary two-dimensional patterns," Journal of Micro/Nanolithography, MEMS, and MOEMS 7(1), 013004 (1 January 2008). https://doi.org/10.1117/1.2838591
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