A new, relatively simple experimental technique for generating arbitrary, two-dimensional patterns with high visibility and higher resolution than allowed by the Rayleigh criterion has been developed. The theoretical and experimental details of the method, based on repeated phase-coherent interference of four beams on a multiphoton absorber, are described. A sample pattern generated by numerical computer simulation of the technique is also shown.
Sean J. Bentley, Sean J. Bentley,
"Nonlinear interferometric lithography for arbitrary two-dimensional patterns," Journal of Micro/Nanolithography, MEMS, and MOEMS 7(1), 013004 (1 January 2008). https://doi.org/10.1117/1.2838591