1 January 2008 Physical characterization of nanoimprinted polymer nanostructures using visible light angular scatterometry
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Visible light angular scatterometry is applied to characterize the geometry and physical properties of sub-100-nm-wide polymer gratings fabricated using nanoimprint lithography and electron beam lithography. Measurement sensitivities to small variations in linewidth and slope angle were evaluated theoretically, which suggests that TM polarized incident light offers improved sensitivity for the measurements of sub-45-nm critical dimensions (CDs). A variable angle scatterometer using a red laser is built, and measurement results of various polymethylmethacrylate (PMMA) gratings with sub-100-nm CDs reveals good accuracies and fit well to the scanning electron microscopy (SEM) measurements. In addition to geometry and dimension measurements, new functionality is implemented in the modeling to characerize polymer residue thickness, polymer flow dynamics, and evidence of stress in the nanoimprinted polymer gratings. Scatterometry is also applied to detect possible undercut line profiles resulting from electron beam lithography. The results promote using this low-cost and noninvasive technique to characterize polymer nanostructures as well as understand and control the underlying lithographic processes.
© (2008) Society of Photo-Optical Instrumentation Engineers (SPIE)
Rayan M. Alassaad, Li Tao, Wenchuang Hu, "Physical characterization of nanoimprinted polymer nanostructures using visible light angular scatterometry," Journal of Micro/Nanolithography, MEMS, and MOEMS 7(1), 013008 (1 January 2008). https://doi.org/10.1117/1.2894772 . Submission:

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