Tunable external cavity diode laser using a micromachined silicon flexure and a volume holographic reflection grating for applications in atomic optics

Ho-Chiao Chuang; Ricardo Jimenez-Martinez; Simon Braun; Dana Z. Anderson; Victor M. Bright

doi:10.1117/1.2911630

1 April 2008 Tunable external cavity diode laser using a micromachined silicon flexure and a volume holographic reflection grating for applications in atomic optics

Ho-Chiao Chuang; Ricardo Jimenez-Martinez; Simon Braun; Dana Z. Anderson; Victor M. Bright;

Author Affiliations +

J. of Micro/Nanolithography, MEMS, and MOEMS, 7(2), 021010 (2008). doi:10.1117/1.2911630

Abstract

We present a novel external cavity diode laser design developed for applications in atomic physics that employs a micromachined silicon flexure to sweep the laser frequency and a volume holographic reflection grating (VHG) to provide the optical feedback. The advantages of using a silicon flexure are its simple microfabrication process and reduction of the overall size of the laser system. The results demonstrate the ⁸⁷Rb, ⁸⁵Rb (rubidium) D2 line absorption at 780 nm in an atomic optics test experiment. Our novel laser system design has a size of 28.76×20.65×12 mm. The wavelength can be tuned and swept from 780.2463 to 780.2379 nm equivalent to 4.14 GHz using piezoelectric transducer (PZT) actuators integrated on the silicon flexure. A frequency tuning range of 17.149 GHz can be obtained by changing the VHG temperature. The deflection of the silicon flexure is 129.19 nm. The advantage of combining a VHG and a silicon flexure is that the frequency can be coarsely tuned to 780.24 nm and swept at this center frequency with a range of 4.14 GHz by PZT. Moreover, the frequency fine tuning can be achieved by changing the VHG temperature to observe the rubidium spectrum. The laser output power is measured as 59 mW at 780.2474 nm.

Citation Download Citation

Ho-Chiao Chuang, Ricardo Jimenez-Martinez, Simon Braun, Dana Z. Anderson, Victor M. Bright, "Tunable external cavity diode laser using a micromachined silicon flexure and a volume holographic reflection grating for applications in atomic optics," Journal of Micro/Nanolithography, MEMS, and MOEMS 7(2), 021010 (1 April 2008). https://doi.org/10.1117/1.2911630

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