1 July 2008 Fabrication of quartz mold with submicrometer features based on laser-assisted contact transfer method
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J. of Micro/Nanolithography, MEMS, and MOEMS, 7(3), 033006 (2008). doi:10.1117/1.2970146
Abstract
We report a simple method for fabricating quartz molds with submicrometer- and nanoscaled surface structures. It utilizes an excimer laser as the energy source and a roller-type contact-printing setup for directly transferring a patterned metallic thin film from a silicon mold to a quartz substrate. The transferred metallic patterns are subsequently used as an etching mask for dry etching on the quartz plate. Experiments have been carried out to determine the optimal parameters for successful pattern transformation. Experimental results on fabricating quartz molds are presented, and potential applications of this innovative pattern transformation method are addressed.
Yung-Chun Lee, Chun-Hsiang Chen, Cheng-Yu Chiu, Fuh-Yu Chang, "Fabrication of quartz mold with submicrometer features based on laser-assisted contact transfer method," Journal of Micro/Nanolithography, MEMS, and MOEMS 7(3), 033006 (1 July 2008). http://dx.doi.org/10.1117/1.2970146
JOURNAL ARTICLE
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KEYWORDS
Quartz

Silicon

Metals

Printing

Etching

Silicon films

Semiconductor lasers

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