1 October 2008 Isopropanol/water as a developer for poly(dimethylglutarimide)
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J. of Micro/Nanolithography, MEMS, and MOEMS, 7(4), 043006 (2008). doi:10.1117/1.2990738
Abstract
Poly(dimethylglutarimide) (PMGI) is a resist that is commonly used in bilayer and trilayer imaging applications. PMGI can be exposed using various radiation sources including deep UV. Currently, there are only two developers for PMGI reported in the literature: tetramethylammonium hydroxide and tetraethylammonium hydroxide. We introduce a new developer for PMGI, a mixture of isopropanol (IPA) and water. Samples were irradiated with deep UV at 254 nm. The IPA/water developer exhibits rapid dissolution of exposed PMGI, of many microns per minute. However, PMGI exhibits high absorption at 254 nm, so the development depth is limited. The depth limit, after a critical dose, increases linearly with the exposure dose.
Robert William Johnstone, Ian G. Foulds, M. Pallapa, Ash M. Parameswaran, "Isopropanol/water as a developer for poly(dimethylglutarimide)," Journal of Micro/Nanolithography, MEMS, and MOEMS 7(4), 043006 (1 October 2008). http://dx.doi.org/10.1117/1.2990738
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KEYWORDS
Etching

Semiconducting wafers

Deep ultraviolet

Gold

Absorption

Optical lithography

Photoresist developing

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