1 April 2009 Fabrication of novel silicon dual atomic force microscope tip with narrow gap
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We propose a novel fabrication process for twin probes of an atomic force microscope (AFM) that consist of a silicon dual tip with a narrow gap. The dual tip with a tetrahedral shape consists of an inclined silicon (111) plane and two vertical planes and was successfully fabricated by using the proposed fabrication process of combining deep reactive ion etching (D-RIE) for silicon trench formation along the silicon (001) direction, selective oxidation of the sidewalls of the trench, and crystalline anisotropic etching. The silicon tips could be sharpened by a low-temperature oxidation process, resulting in a tip radius of about 10 nm. In addition, the dual silicon tip formation, dual AFM probe with cantilever, and thermal actuator were also successfully fabricated from a silicon-on-insulator (SOI) water. The gap of the dual tip was about 2.9 µm, with trench etching 1 µm wide and sidewall oxidation 1 µm thick.
© (2009) Society of Photo-Optical Instrumentation Engineers (SPIE)
Shinji Morita, Shinji Morita, Takashi Mineta, Takashi Mineta, Eiji Makino, Eiji Makino, Akihiro Umino, Akihiro Umino, Takahiro Kawashima, Takahiro Kawashima, Takayuki Shibata, Takayuki Shibata, } "Fabrication of novel silicon dual atomic force microscope tip with narrow gap," Journal of Micro/Nanolithography, MEMS, and MOEMS 8(2), 021117 (1 April 2009). https://doi.org/10.1117/1.3142970 . Submission:

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