1 July 2009 Patterning of multilayer dielectric optical filters using metal masks fabricated by electroforming and photolithography
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Abstract
Ni films, replacing photoresists, serve as masks in the selective deposition of optical thin films by electron-beam gun evaporation at a substrate temperature of 300°C. Photolithography is adopted herein to define the growth of Ni films by electroforming. Mosaic patterns with a width of 20 µm are employed as red color filters, which are longwave pass. These red filters are formed from alternate SiO2 and TiO2 layers and have a mean transmittance of >90%. The experimental results show that the combined use of photolithography, electroforming, and electron-beam gun evaporation can deposit miniaturized multilayer dielectric coatings with high light transmittance in a hot process.
© (2009) Society of Photo-Optical Instrumentation Engineers (SPIE)
Cheng-Chung Jaing, Cheng-Chung Jaing, Chii-Rong Yang, Chii-Rong Yang, Chun-Ming Chang, Chun-Ming Chang, Chao-Te Lee, Chao-Te Lee, Chien-Nan Hsiao, Chien-Nan Hsiao, } "Patterning of multilayer dielectric optical filters using metal masks fabricated by electroforming and photolithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 8(3), 033009 (1 July 2009). https://doi.org/10.1117/1.3222910 . Submission:
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