1 October 2009 Residual speckle in a lithographic illumination system
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Abstract
Finite bandwidth and finite exposure time place a fundamental limit on dose uniformity. We evaluate the amplitude and spatial distribution of this residual speckle in a given type of lithographic illumination system. For nominal bandwidths and exposure times, the level of dose nonuniformity is on the order of several percent. We argue that this effect actually makes only a small contribution to line edge roughness.
© (2009) Society of Photo-Optical Instrumentation Engineers (SPIE)
Gregg M. Gallatin, Naonori Kita, Tomoko Ujike, William N. Partlo, "Residual speckle in a lithographic illumination system," Journal of Micro/Nanolithography, MEMS, and MOEMS 8(4), 043003 (1 October 2009). https://doi.org/10.1117/1.3256007 . Submission:
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