1 October 2009 Fabrication of silicon microring resonator with smooth sidewalls
Author Affiliations +
J. of Micro/Nanolithography, MEMS, and MOEMS, 8(4), 043060 (2009). doi:10.1117/1.3258487
Fabrication of silicon microring resonators was optimized by using electron-beam lithography (EBL) and inductively coupled plasma (ICP) etching with different mask materials. Sidewall roughness of less than 10 nm was revealed by high-resolution scanning electron microscopy (SEM) without any post-etch process. The fabrication processes are described in detail, and comparisons are made in consideration of process complexity, process latitude, and sidewall roughness.
Yao Chen, Junbo Feng, Zhiping Zhou, Jun Yu, Christopher J. Summers, David S. Citrin, "Fabrication of silicon microring resonator with smooth sidewalls," Journal of Micro/Nanolithography, MEMS, and MOEMS 8(4), 043060 (1 October 2009). https://doi.org/10.1117/1.3258487

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