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1 October 2009 Fabrication of silicon microring resonator with smooth sidewalls
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Abstract
Fabrication of silicon microring resonators was optimized by using electron-beam lithography (EBL) and inductively coupled plasma (ICP) etching with different mask materials. Sidewall roughness of less than 10 nm was revealed by high-resolution scanning electron microscopy (SEM) without any post-etch process. The fabrication processes are described in detail, and comparisons are made in consideration of process complexity, process latitude, and sidewall roughness.
©(2009) Society of Photo-Optical Instrumentation Engineers (SPIE)
Yao Chen, Junbo Feng, Zhiping Zhou, Jun Yu, Christopher J. Summers, and David S. Citrin "Fabrication of silicon microring resonator with smooth sidewalls," Journal of Micro/Nanolithography, MEMS, and MOEMS 8(4), 043060 (1 October 2009). https://doi.org/10.1117/1.3258487
Published: 1 October 2009
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