1 October 2009 Fabrication of silicon microring resonator with smooth sidewalls
Author Affiliations +
Abstract
Fabrication of silicon microring resonators was optimized by using electron-beam lithography (EBL) and inductively coupled plasma (ICP) etching with different mask materials. Sidewall roughness of less than 10 nm was revealed by high-resolution scanning electron microscopy (SEM) without any post-etch process. The fabrication processes are described in detail, and comparisons are made in consideration of process complexity, process latitude, and sidewall roughness.
© (2009) Society of Photo-Optical Instrumentation Engineers (SPIE)
Yao Chen, Yao Chen, Junbo Feng, Junbo Feng, Zhiping Zhou, Zhiping Zhou, Jun Yu, Jun Yu, Christopher J. Summers, Christopher J. Summers, David S. Citrin, David S. Citrin, } "Fabrication of silicon microring resonator with smooth sidewalls," Journal of Micro/Nanolithography, MEMS, and MOEMS 8(4), 043060 (1 October 2009). https://doi.org/10.1117/1.3258487 . Submission:
JOURNAL ARTICLE
5 PAGES


SHARE
RELATED CONTENT


Back to Top