1 October 2010 Special Section Guest Editorial: Line-Edge Roughness
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J. of Micro/Nanolithography, MEMS, and MOEMS, 9(4), 041201 (2010). doi:10.1117/1.3532953
Abstract
This PDF file contains the editorial “Special Section Guest Editorial: Line-Edge Roughness” for JM3 Vol. 9 Issue 04
Chris A. Mack, Will Conley, "Special Section Guest Editorial: Line-Edge Roughness," Journal of Micro/Nanolithography, MEMS, and MOEMS 9(4), 041201 (1 October 2010). http://dx.doi.org/10.1117/1.3532953
Submission: Received ; Accepted
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KEYWORDS
Line edge roughness

Manufacturing

Semiconductors

Line width roughness

Optical lithography

Chemical species

Photomasks

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