1 April 2010 Micropore and nanopore fabrication in hollow antiresonant reflecting optical waveguides
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Abstract
We demonstrate the fabrication of micropore and nanopore features in hollow antiresonant reflecting optical waveguides to create an electrical and optical analysis platform that can size select and detect a single nanoparticle. Micropores (4 µm diameter) are reactive-ion etched through the top SiO2 and SiN layers of the waveguides, leaving a thin SiN membrane above the hollow core. Nanopores are formed in the SiN membranes using a focused ion-beam etch process that provides control over the pore size. Openings as small as 20 nm in diameter are created. Optical loss measurements indicate that micropores did not significantly alter the loss along the waveguide.
© (2010) Society of Photo-Optical Instrumentation Engineers (SPIE)
Matthew R. Holmes, Matthew R. Holmes, Tao Shang, Tao Shang, Aaron R. Hawkins, Aaron R. Hawkins, Mikhail I. Rudenko, Mikhail I. Rudenko, Philip Measor, Philip Measor, Holger Schmidt, Holger Schmidt, } "Micropore and nanopore fabrication in hollow antiresonant reflecting optical waveguides," Journal of Micro/Nanolithography, MEMS, and MOEMS 9(2), 023004 (1 April 2010). https://doi.org/10.1117/1.3378152 . Submission:
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