1 April 2010 Single-exposure maskless plasmonic lithography for patterning of periodic nanoscale grating features
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Abstract
A lithography technique for patterning one-dimensional (1-D) nanoscale grating features based on surface plasmon (SP) interference is demonstrated both experimentally and numerically. We report a cost-effective, single-exposure maskless plasmonic lithography to generate 156-nm periodic grating lines at an exposure wavelength of 364 nm.
© (2010) Society of Photo-Optical Instrumentation Engineers (SPIE)
K. V. Sreekanth, K. V. Sreekanth, Vadakke Matham Murukeshan, Vadakke Matham Murukeshan, } "Single-exposure maskless plasmonic lithography for patterning of periodic nanoscale grating features," Journal of Micro/Nanolithography, MEMS, and MOEMS 9(2), 023007 (1 April 2010). https://doi.org/10.1117/1.3386680 . Submission:
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