1 July 2010 Focused ion beam-based nanoimprint stamp for replicating micro/nanostructures under low temperature
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Abstract
Focused ion beam (FIB) was employed to fabricate nanoimprint lithography stamps. Complex micro/nanopatterns were fabricated in the stamp, including curved nanograting structures. These micro/nanostructures were then replicated to SU-8 2000.1 resist, with an imprint temperature of 95 °C, which is lower than for conventional imprint polymers. Atomic force microscopy was used to characterize the surface profiles of stamp and replica's and the replication fidelity as well. The results show that nanoimprint with the FIB fabricated stamp can successfully replicate complex micro/nanostructures under low temperature in SU-8.
© (2010) Society of Photo-Optical Instrumentation Engineers (SPIE)
Hongwen Sun, Hongwen Sun, Guogao Liu, Guogao Liu, Shanming Lin, Shanming Lin, Jingquan Liu, Jingquan Liu, Di Chen, Di Chen, } "Focused ion beam-based nanoimprint stamp for replicating micro/nanostructures under low temperature," Journal of Micro/Nanolithography, MEMS, and MOEMS 9(3), 033005 (1 July 2010). https://doi.org/10.1117/1.3469818 . Submission:
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