Plant-based resist materials for ultraviolet curing nanoimprint lithography

Satoshi Takei

doi:10.1117/1.3475951

Abstract

Plant-based resist materials with liquid trehalose derivatives are investigated to achieve low volumetric shrinkage in ultraviolet curing nanoimprint lithography. This procedure is proven to be suitable for resist material design in the process conditions of ultraviolet curing nanoimprint lithography. The developed plant-based resist material using liquid trehalose derivatives with epoxy groups produces high-quality imprint images of 65-nm line and space. The distinctive bulky glucose structure in trehalose derivatives is considered to be effective for minimizing volumetric shrinkage of resist film during ultraviolet polymerization.

Citation Download Citation

Satoshi Takei, "Plant-based resist materials for ultraviolet curing nanoimprint lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 9(3), 033006 (1 July 2010). https://doi.org/10.1117/1.3475951 . Submission:

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