1 October 2010 Characterization of dry etching of TiO2/SiO2 distributed Bragg reflectors for tunable optical sensor arrays
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Abstract
We present the characterization of a dry-etching process for high-contrast TiO2/SiO2 distributed Bragg reflectors, by inductively coupled plasma reactive ion etching, focusing on the etch rate and the etch selectivity. Photoresists and metals as etch masks were investigated. An excellent etch profile using an indium tin oxide mask was obtained, with an etch rate of >80 nm/min at a pressure of 6 mTorr. The experiments were developed for structuring Fabry-Pérot filters for tunable optical sensor arrays.
© (2010) Society of Photo-Optical Instrumentation Engineers (SPIE)
Onny Setyawati, Onny Setyawati, Markus Engenhorst, Markus Engenhorst, Martin Bartels, Martin Bartels, Vadim Daneker, Vadim Daneker, Stefan Wittzack, Stefan Wittzack, Tatjana Woit, Tatjana Woit, Florestan Köhler, Florestan Köhler, Harmut H. Hillmer, Harmut H. Hillmer, } "Characterization of dry etching of TiO2/SiO2 distributed Bragg reflectors for tunable optical sensor arrays," Journal of Micro/Nanolithography, MEMS, and MOEMS 9(4), 041110 (1 October 2010). https://doi.org/10.1117/1.3524828 . Submission:
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