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1 October 2010 Special Section Guest Editorial: Line-Edge Roughness
Chris A. Mack, Will Conley
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Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 9, Issue 4, 041201 (October 2010). https://doi.org/10.1117/1.3532953
This PDF file contains the editorial “Special Section Guest Editorial: Line-Edge Roughness” for JM3 Vol. 9 Issue 04
©(2010) Society of Photo-Optical Instrumentation Engineers (SPIE)
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Chris A. Mack and Will Conley "Special Section Guest Editorial: Line-Edge Roughness," Journal of Micro/Nanolithography, MEMS, and MOEMS 9(4), 041201 (1 October 2010). https://doi.org/10.1117/1.3532953
Published: 1 October 2010
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KEYWORDS
Line edge roughness
Manufacturing
Semiconductors
Chemical species
Control systems
Direct write lithography
Line width roughness
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