18 February 2016 In-situ height engineering of InGaAs/GaAs quantum dots by chemical beam epitaxy
Author Affiliations +
Abstract
This work reports on a chemical beam epitaxy growth study of InGaAs/GaAs quantum dots (QDs) engineered using an in-situ indium-flush technique. The emission energy of these structures has been selectively tuned over 225 meV by varying the dot height from 7 to 2 nm. A blueshift of the photoluminescence (PL) emission peak and a decrease of the intersublevel spacing energy are observed when the dot height is reduced. Numerical investigations of the influence of dot structural parameters on their electronic structure have been carried out by solving the single-particle one-band effective mass Schrödinger equation in cylindrical coordinates, for lens-shaped QDs. The correlation between numerical calculations and PL results is used to better describe the influence of the In-flush technique on both the dot height and the dot composition.
© 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
Jihene Zribi, Jihene Zribi, Denis Morris, Denis Morris, Bouraoui Ilahi, Bouraoui Ilahi, Amal Aldhubaib, Amal Aldhubaib, Vincent Aimez, Vincent Aimez, Richard Ares, Richard Ares, } "In-situ height engineering of InGaAs/GaAs quantum dots by chemical beam epitaxy," Journal of Nanophotonics 10(3), 033502 (18 February 2016). https://doi.org/10.1117/1.JNP.10.033502 . Submission:
JOURNAL ARTICLE
9 PAGES


SHARE
Back to Top