20 December 2016 Analysis of Ag nanoparticle resist in fabrication of transmission-enhanced subwavelength structures
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Abstract
A theoretical model is proposed to analyze the fabrication of metal nanopartical resist by metal nanofilm annealing, which is used in the manufacture of the transmission-enhanced subwavelength structures at the interface of the optical glass. Based on the conservation of volume of the metal before annealing and after heat treatment, the theoretical relationships of the structure parameters between the metal nanofilm and the metal nanoparticles are obtained. The experimental results coincide well with the theory model, which offers a theoretical guidance to fabricate subwavelength antireflected structures with the advantage of low cost achieved through metal nanofilm annealing. By this means, the average transmission of the quartz device intensifies to 97.9% for the structures fabricated on the both sides compared with the 93% for the unstructured one.
© 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
Xiangdong Kong, Xiangdong Kong, Yuegang Fu, Yuegang Fu, Liangping Xia, Liangping Xia, Weiguo Zhang, Weiguo Zhang, Ziyin Zhang, Ziyin Zhang, Lianhe Dong, Lianhe Dong, Deqiang Wang, Deqiang Wang, Chunlei Du, Chunlei Du, } "Analysis of Ag nanoparticle resist in fabrication of transmission-enhanced subwavelength structures," Journal of Nanophotonics 10(4), 046017 (20 December 2016). https://doi.org/10.1117/1.JNP.10.046017 . Submission: Received: 22 July 2016; Accepted: 29 November 2016
Received: 22 July 2016; Accepted: 29 November 2016; Published: 20 December 2016
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