15 September 2017 Analysis of random antireflective structures fabricated by silver dewetting to enhance transmission
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Abstract
The random antireflective structures are modeled by the analysis of the random morphology distribution. According to the effective medium theory, the transmission of the antireflective structure is calculated by dividing the structure into multilayer, and the dependence on parameters of the subwavelength is analyzed in detail. In the single-variable condition, etching depth, half breadth of distribution, and median of distribution get a positive correlation with the transmittance where the etching depth plays a most important part in enhancing the transmittance, whereas the angle of structures gets a negative correlation. The experimental results coincide well with the calculation and analysis. The analysis offers a theory guidance to fabricate random subwavelength antireflected structures using metal dewetting.
© 2017 Society of Photo-Optical Instrumentation Engineers (SPIE)
Xiangdong Kong, Xiangdong Kong, Yuegang Fu, Yuegang Fu, Weiguo Zhang, Weiguo Zhang, Lianhe Dong, Lianhe Dong, Jianhong Zhou, Jianhong Zhou, Deqiang Wang, Deqiang Wang, } "Analysis of random antireflective structures fabricated by silver dewetting to enhance transmission," Journal of Nanophotonics 11(3), 036019 (15 September 2017). https://doi.org/10.1117/1.JNP.11.036019 . Submission: Received: 22 May 2017; Accepted: 23 August 2017
Received: 22 May 2017; Accepted: 23 August 2017; Published: 15 September 2017
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