9 April 2018 Maskless lithography of CMOS-compatible materials for hybrid plasmonic nanophotonics: aluminum nitride/aluminum oxide/aluminum waveguides
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Abstract
We demonstrate maskless lithography fabrication of nanolayered heterostructured hybrid plasmonic waveguides. This includes the measured optical properties of pulsed magnetron sputtered 15 nm films of aluminum oxide and aluminum nitride. Hybrid plasmonic waveguides, where the modes highest intensity is largely confined to the thin aluminum oxide layer, were constructed by maskless lithography using an aperture-type near-field scanning optical microscope.
© 2018 Society of Photo-Optical Instrumentation Engineers (SPIE)
M. Joseph Roberts, M. Joseph Roberts, Mark B. Moran, Mark B. Moran, Linda F. Johnson, Linda F. Johnson, Will Freeman, Will Freeman, } "Maskless lithography of CMOS-compatible materials for hybrid plasmonic nanophotonics: aluminum nitride/aluminum oxide/aluminum waveguides," Journal of Nanophotonics 12(2), 026001 (9 April 2018). https://doi.org/10.1117/1.JNP.12.026001 . Submission: Received: 29 September 2017; Accepted: 7 March 2018
Received: 29 September 2017; Accepted: 7 March 2018; Published: 9 April 2018
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