1 October 2010 Near-field intensity correlations on nanoscaled random silver/dielectric films
Author Affiliations +
J. of Nanophotonics, 4(1), 049505 (2010). doi:10.1117/1.3506519
Abstract
Near-field intensity distributions in inhomogeneous silver nanostructures were investigated using near-field optical microscopy. By varying the metallic concentration and the excitation wavelength, different plasmon scattering regimes were addressed and identified using statistical analysis tools such as the probability density function and intensity auto-correlation function. The intensity correlation length was found to indicate an intermediate regime where both surface scattering and plasmon localization coexist on the same scale.
Julien Laverdant, Stephanie Buil, Jean-Pierre Hermier, Xavier Quelin, "Near-field intensity correlations on nanoscaled random silver/dielectric films," Journal of Nanophotonics 4(1), 049505 (1 October 2010). http://dx.doi.org/10.1117/1.3506519
Submission: Received ; Accepted
JOURNAL ARTICLE
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KEYWORDS
Scattering

Near field

Plasmons

Near field scanning optical microscopy

Silver

Light scattering

Statistical analysis

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