Correction of positioning error in Talbot lithography under noncoherent illumination

Milad Gharooni; Abbas Chimeh; Bahador Valizadeh; Shams Mohajerzadeh; Mahmoud Shahabadi

doi:10.1117/1.JNP.8.084089

6 November 2014 Correction of positioning error in Talbot lithography under noncoherent illumination

Milad Gharooni, Abbas Chimeh, Bahador Valizadeh, Shams Mohajerzadeh, Mahmoud Shahabadi

Author Affiliations +

Journal of Nanophotonics, Vol. 8, Issue 1, 084089 (November 2014). https://doi.org/10.1117/1.JNP.8.084089

Abstract

A method for the correction of positioning error in Talbot lithography is proposed and investigated both experimentally and theoretically. The enhancement of the features in this method is achieved by the temporally noncoherent illumination, which leads to the overlap between Talbot images of different frequencies. This results in an improvement in the depth of focus and, thus, less sensitive patterns to the positioning error. A spectral-domain analysis for the estimation of the positioning error is employed for the verification and finding of a criterion for selecting appropriate light sources.

Citation Download Citation

Milad Gharooni, Abbas Chimeh, Bahador Valizadeh, Shams Mohajerzadeh, and Mahmoud Shahabadi "Correction of positioning error in Talbot lithography under noncoherent illumination," Journal of Nanophotonics 8(1), 084089 (6 November 2014). https://doi.org/10.1117/1.JNP.8.084089

Published: 6 November 2014

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