21 January 2014 Fabrication of large-area two-dimensional array of air holes with different hole shapes for optical and terahertz wavelength regions
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Abstract
Fabrication of metal-dielectric nanostructures with subwavelength precision is necessary for plasmon-mediated novel applications. Electron beam lithography (EBL) offers such precision, but for shapes other than circles, squares, and lines, process optimization is required. The EBL and dry etching processes are optimized for subwavelength precision in large area arrays of air groove patterns in gold film in two different length scales. We fabricated one structure for optical frequencies with an asymmetric, nonstandard element having a minimum feature size of about 50 nm and another for terahertz wavelength region with a large aspect ratio of about 975.
© 2014 Society of Photo-Optical Instrumentation Engineers (SPIE)
Raj Patil, Sheng Lan, Achanta V. Gopal, "Fabrication of large-area two-dimensional array of air holes with different hole shapes for optical and terahertz wavelength regions," Journal of Nanophotonics 8(1), 083896 (21 January 2014). https://doi.org/10.1117/1.JNP.8.083896
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