6 November 2014 Correction of positioning error in Talbot lithography under noncoherent illumination
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Abstract
A method for the correction of positioning error in Talbot lithography is proposed and investigated both experimentally and theoretically. The enhancement of the features in this method is achieved by the temporally noncoherent illumination, which leads to the overlap between Talbot images of different frequencies. This results in an improvement in the depth of focus and, thus, less sensitive patterns to the positioning error. A spectral-domain analysis for the estimation of the positioning error is employed for the verification and finding of a criterion for selecting appropriate light sources.
© 2014 Society of Photo-Optical Instrumentation Engineers (SPIE)
Milad Gharooni, Abbas Chimeh, Bahador Valizadeh, Shams Mohajerzadeh, Mahmoud Shahabadi, "Correction of positioning error in Talbot lithography under noncoherent illumination," Journal of Nanophotonics 8(1), 084089 (6 November 2014). https://doi.org/10.1117/1.JNP.8.084089 . Submission:
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