Ultraviolet stability and contamination analysis of Spectralon diffuse reflectance material

Albert E. Stiegman; Carol J. Bruegge; Arthur W. Springsteen

doi:10.1117/12.132374

1 April 1993 Ultraviolet stability and contamination analysis of Spectralon diffuse reflectance material

Albert E. Stiegman, Carol J. Bruegge, Arthur W. Springsteen

Author Affiliations +

Optical Engineering, Vol. 32, Issue 4, (April 1993). https://doi.org/10.1117/12.132374

Abstract

A detailed chemical analysis was carried out on Spectralon, a highly Lambertian, diffuse reflectance material. Results of this investigation unambiguously identified the presence of an organic (hydrocarbon) impurity intrinsic to the commercial material. This impurity could be removed by a vacuum bake-out procedure and was identified as the cause of optical changes (degradation) that occur in the material when exposed to UV light. It was found that when this impurity was removed, the Spectralon material was photochemically stable and maintained its reflectance properties even after extensive solar UV exposure.

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Albert E. Stiegman, Carol J. Bruegge, and Arthur W. Springsteen "Ultraviolet stability and contamination analysis of Spectralon diffuse reflectance material," Optical Engineering 32(4), (1 April 1993). https://doi.org/10.1117/12.132374

Published: 1 April 1993

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