Characterization of homogeneous and inhomogeneous Si-based optical coatings deposited in dual-frequency plasma

Daniel Poitras; Pierre Leroux; Jolanta Ewa Klemberg-Sapieha; Subhash C. Gujrathi; Ludvik Martinu

doi:10.1117/1.600833

1 September 1996 Characterization of homogeneous and inhomogeneous Si-based optical coatings deposited in dual-frequency plasma

Daniel Poitras, Pierre Leroux, Jolanta Ewa Klemberg-Sapieha, Subhash C. Gujrathi, Ludvik Martinu

Author Affiliations +

Optical Engineering, Vol. 35, Issue 9, (September 1996). https://doi.org/10.1117/1.600833

Silicon-compound optical coatings (silicon nitride, dioxide, oxynitrides) were prepared by plasma-enhanced chemical vapor deposition (PECVD) at near-ambient substrate temperature from SiH4/N2O/NH3 mixtures, using a dual-mode microwave/radiofrequency plasma system. The refractive index profile of the films was adjusted with depth in two ways: (1) between 1.45 (SiO2) and 1.90 (SiN1.3) by varying the N2O/NH3 feed gas ratio, and (2) between 1.65 and 1.90 for SiN1.3 films, by increasing the energy of bombarding ions from 5 eV to 400 eV. The film composition was changed either abruptly (multilayers) or continuously (graded-index, inhomogeneous layers). The resulting optical properties are correlated with the depth profile analysis of the chemical composition, and with mechanical characteristics such as adhesion, stress, and scratch resistance.

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Daniel Poitras, Pierre Leroux, Jolanta Ewa Klemberg-Sapieha, Subhash C. Gujrathi, and Ludvik Martinu "Characterization of homogeneous and inhomogeneous Si-based optical coatings deposited in dual-frequency plasma," Optical Engineering 35(9), (1 September 1996). https://doi.org/10.1117/1.600833

Published: 1 September 1996

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