Comparative study of ultraviolet-infrared cutoff filters prepared by reactive electron-beam deposition and reactive ion-assisted deposition

Rung-Ywan Tsai; Sen Chrong Shiau; Chii Hua Lee

doi:10.1117/1.601663

1 May 1998 Comparative study of ultraviolet-infrared cutoff filters prepared by reactive electron-beam deposition and reactive ion-assisted deposition

Rung-Ywan Tsai, Sen Chrong Shiau, Chii Hua Lee

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Optical Engineering, Vol. 37, Issue 5, (May 1998). https://doi.org/10.1117/1.601663

UV-IR cutoff filters consisting a number of alternating layers of TiO2 and SiO2 were prepared by reactive electron-beam deposition (EBD) at a glass-substrate temperature of 300°C and by reactive ion- assisted deposition (IAD) at an ambient substrate temperature. All the filters were prepared in the same coater, equipped with two electron beam guns and one advanced plasma source. The uniformity and reproducibility of filters prepared by both techniques were investigated and compared, and correlated with results from single-layer materials. The useful sample radii, with optical thickness variation less than 1.6%, for EBD and iAd filters were up to 50 and 30 cm, respectively. The run-to- run reproducibility of EBD filters was as good as or even better than that of IAD filters. However, the temperature stability of IAD filters was superior to that of EBD filters, which confirmed that the energetic ion bombardments made the component films denser.

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Rung-Ywan Tsai, Sen Chrong Shiau, and Chii Hua Lee "Comparative study of ultraviolet-infrared cutoff filters prepared by reactive electron-beam deposition and reactive ion-assisted deposition," Optical Engineering 37(5), (1 May 1998). https://doi.org/10.1117/1.601663

Published: 1 May 1998

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