Self-aligned photoresist patterning for integrated optics

David F. Geraghty; Pekka Ayras; Ghassan E. Jabbour; Seppo Honkanen; Nasser Peyghambarian

doi:10.1117/1.602436

1 February 2000 Self-aligned photoresist patterning for integrated optics

David F. Geraghty, Pekka Ayras, Ghassan E. Jabbour, Seppo Honkanen, Nasser Peyghambarian

Optical Engineering, Vol. 39, Issue 2, (February 2000). https://doi.org/10.1117/1.602436

This PDF contains the communications section which includes "Self-aligned photoresist patterning for integrated optics".

Citation Download Citation

David F. Geraghty, Pekka Ayras, Ghassan E. Jabbour, Seppo Honkanen, and Nasser Peyghambarian "Self-aligned photoresist patterning for integrated optics," Optical Engineering 39(2), (1 February 2000). https://doi.org/10.1117/1.602436

Published: 1 February 2000

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available