1 November 2002 Effective refractive index change of X-cut Z-propagation Ti:LiNbO3 waveguides by laser ablation
Chii-Chang Chen, Vincent Armbruster, Henri Porte, Alain Carenco, Jean-Pierre Goedgebuer
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Laser ablation was applied to X-cut Z-propagation Ti:LiNbO3 waveguides. The effective refractive index change of the waveguides after the ablation was measured for both TE and TM modes. The change is more sensitive to the ablation for the TE than for the TM mode. This phenomenon was confirmed by measuring the modal effective refractive indices of a nonablated and an ablated planar Ti:LiNbO3 waveguide with the m-line method. A photoelastic effect that may cause the different effective index changes of the waveguide modes after ablation is discussed.
©(2002) Society of Photo-Optical Instrumentation Engineers (SPIE)
Chii-Chang Chen, Vincent Armbruster, Henri Porte, Alain Carenco, and Jean-Pierre Goedgebuer "Effective refractive index change of X-cut Z-propagation Ti:LiNbO3 waveguides by laser ablation," Optical Engineering 41(11), (1 November 2002). https://doi.org/10.1117/1.1510764
Published: 1 November 2002
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KEYWORDS
Waveguides

Refractive index

Laser ablation

Modulators

Crystals

Photoelasticity

Electro optics

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