1 July 2003 Fluorescent microscopy of wet-cleaned surfaces: imaging of water stains distribution
Katrina Mikhaylich, V. V. Yakovlev
Author Affiliations +
We use fluorescence optical microscopy to identify water stains on the surface of wet-cleaned silicon wafers. By using a commonly used confocal microscope, submicron resolution is routinely achieved, and both micro- and macroscopic distribution of water stains can be measured. The proposed technique is easy to implement, does not require any special conditions such as vacuum, and can serve as a powerful method in determining the optimal conditions for wet cleaning.
©(2003) Society of Photo-Optical Instrumentation Engineers (SPIE)
Katrina Mikhaylich and V. V. Yakovlev "Fluorescent microscopy of wet-cleaned surfaces: imaging of water stains distribution," Optical Engineering 42(7), (1 July 2003). https://doi.org/10.1117/1.1578493
Published: 1 July 2003
Lens.org Logo
CITATIONS
Cited by 3 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Semiconducting wafers

Luminescence

Confocal microscopy

Microscopy

Silicon

Image resolution

Spatial resolution

Back to Top