Improved environmental stability for plasma enhanced chemical vapor deposition SiO2 waveguides using buried channel designs

Thomas A. Wall; Roger P. Chu; Joshua W. Parks; Damla Ozcelik; Holger Schmidt; Aaron R. Hawkins

doi:10.1117/1.OE.55.4.040501

25 April 2016 Improved environmental stability for plasma enhanced chemical vapor deposition SiO₂ waveguides using buried channel designs

Thomas A. Wall, Roger P. Chu, Joshua W. Parks, Damla Ozcelik, Holger Schmidt, Aaron R. Hawkins

Author Affiliations +

Optical Engineering, Vol. 55, Issue 4, 040501 (April 2016). https://doi.org/10.1117/1.OE.55.4.040501

Abstract

Ridge and buried channel waveguides (BCWs) made using plasma-enhanced chemical vapor deposition SiO₂ were fabricated and tested after being subjected to long 85°C water baths. The water bath was used to investigate the effects of any water absorption in the ridge and BCWs. Optical mode spreading and power throughput were measured over a period of three weeks. The ridge waveguides quickly absorbed water within the critical guiding portion of the waveguide. This caused a nonuniformity in the refractive index profile, leading to poor modal confinement after only seven days. The BCWs possessed a low index top cladding layer of SiO₂, which caused an increase in the longevity of the waveguides, and after 21 days, the BCW samples still maintained ∼20% throughput, much higher than the ridge waveguides, which had a throughput under 5%.

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Thomas A. Wall, Roger P. Chu, Joshua W. Parks, Damla Ozcelik, Holger Schmidt, and Aaron R. Hawkins "Improved environmental stability for plasma enhanced chemical vapor deposition SiO₂ waveguides using buried channel designs," Optical Engineering 55(4), 040501 (25 April 2016). https://doi.org/10.1117/1.OE.55.4.040501

Published: 25 April 2016

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