1 June 1981 Optical Properties Of Tellurium Films Used For Data Recording
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Abstract
The complex optical index of refraction for evaporated films of tellurium has been measured using ellipsometry over the wavelength range 439 to 633 nm. Values of n and k as a function of wavelength and as a function of thickness are presented. The transmittance and reflectance of single layers of tellurium, as well as multilayer structures to be used for optical data recording media, are shown as a function of wavelength. Oxide formation of these films has also been measured, and a model for the role of oxides in altering adhesion of the films is presented.
Thomas H. Allen, Thomas H. Allen, Gary S. Ash, Gary S. Ash, } "Optical Properties Of Tellurium Films Used For Data Recording," Optical Engineering 20(3), 203373 (1 June 1981). https://doi.org/10.1117/12.7972725 . Submission:
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