Reduction Of Errors Of Microphotographic Reproductions By Optimal Corrections Of Original Masks

Bahaa E.A. Saleh; Soheil I. Sayegh

doi:10.1117/12.7972810

1 October 1981 Reduction Of Errors Of Microphotographic Reproductions By Optimal Corrections Of Original Masks

Bahaa E.A. Saleh, Soheil I. Sayegh

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Optical Engineering, Vol. 20, Issue 5, 205781 (October 1981). https://doi.org/10.1117/12.7972810

Abstract

Using image restoration techniques, we report on an algorithm for determining the optimum correction of original masks, which are to be reduced by a given microphotographic system, in order to compensate for the system's distortion. The film is assumed highly nonlinear. As an example, we compute the profile of serifs that should be added to corners to compensate for distortion in a diffraction-limited imaging system.

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Bahaa E.A. Saleh and Soheil I. Sayegh "Reduction Of Errors Of Microphotographic Reproductions By Optimal Corrections Of Original Masks," Optical Engineering 20(5), 205781 (1 October 1981). https://doi.org/10.1117/12.7972810

Published: 1 October 1981

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