1 June 1982 Developments In Moire Interferometry
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Abstract
Recent progress in high-sensitivity moire interferometry is reviewed. Interference patterns reveal full-field contour maps of in-plane displacements. Sensitivity corresponds to moire with 1200 lines/mm (30,480 //in.) for most examples, but approaches the theoretical limit of X/2 displacement per fringe in one demonstration. Techniques for producing cross-line phase gratings on specimens are described, as well as use of real and virtual reference gratings. Carrier patterns and optical filtering are used to cancel initial or no-load patterns. Diverse applications are illustrated.
Daniel Post, "Developments In Moire Interferometry," Optical Engineering 21(3), 213458 (1 June 1982). https://doi.org/10.1117/12.7972930 . Submission:
JOURNAL ARTICLE
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