1 December 1982 Ion Polishing Of Optical Surfaces
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Abstract
Broad beam ion sources have been employed to remove material from (or deposit materials onto) optical surfaces in a highly controlled fashion without mechanically contacting the optic surface. Thus, ion processing techniques should be applicable for figuring high energy laser mirrors. The topo-graphical etching and deposition facility at TRW has been used for etching laser gratings, which illustrate processing capabilities demonstrated to date. The facility includes a 10 cm diameter argon ion source, typically operated at 1000 eV and 1 mA/cm2, microprocessor controlled x-y translation tables, and asso-ciated vacuum equipment, fixturing, and electronics. Etch depth control to better than 100 A at 4.2 micrometers groove spacing was achieved on molybdenum mirrors weighing up to 150 pounds.
S. Zafran, K. A. Kaufman, M. M. Silver, "Ion Polishing Of Optical Surfaces," Optical Engineering 21(6), 216002 (1 December 1982). https://doi.org/10.1117/12.7973023 . Submission:
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