Broad beam ion sources have been employed to remove material from (or deposit materials onto) optical surfaces in a highly controlled fashion without mechanically contacting the optic surface. Thus, ion processing techniques should be applicable for figuring high energy laser mirrors. The topo-graphical etching and deposition facility at TRW has been used for etching laser gratings, which illustrate processing capabilities demonstrated to date. The facility includes a 10 cm diameter argon ion source, typically operated at 1000 eV and 1 mA/cm2, microprocessor controlled x-y translation tables, and asso-ciated vacuum equipment, fixturing, and electronics. Etch depth control to better than 100 A at 4.2 micrometers groove spacing was achieved on molybdenum mirrors weighing up to 150 pounds.