1 February 1983 Use Of Laser Annealing To Achieve Low Loss In Corning 7059 Glass, ZnO, Si3N4, Nb205, and Ta205 Optical Thin-Film Waveguides
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Abstract
We report considerable success in using the technique of laser annealing to reduce scattering in a variety of thin-film optical waveguides deposited onto thermally oxidized silicon substrates. For the materials Si3N4, Nb2O5, and Ta205, values of waveguide loss less than 1 dB/cm were achieved. Values of waveguide loss as low as 0.01 dB/cm have been measured for laser-annealed ZnO waveguides and for Corning 7059 glass waveguides which have been both laser annealed and had surface coatings applied.
S. Dutta, H. E. Jackson, J. T. Boyd, "Use Of Laser Annealing To Achieve Low Loss In Corning 7059 Glass, ZnO, Si3N4, Nb205, and Ta205 Optical Thin-Film Waveguides," Optical Engineering 22(1), 221117 (1 February 1983). https://doi.org/10.1117/12.7973058 . Submission:
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