1 April 1983 State Of Art Of Acrylate Resists: An Overview Of Polymer Structure And Lithographic Performance
Author Affiliations +
Abstract
The acrylate family of resists based on polymethyl methacrylate (PMMA) has paved the way for submicron lithography. The physical and chemical modifications, which have improved the performance of PMMA, are reviewed. These improvements include sensitivity to radiation (electron-beam, optical, ion, and x-ray), thermal and plasma process stability, and superior film quality. Structural modifications of the acrylate polymer chain have been the main contributors to enhanced lithographic performance.
Wayne M. Moreau, "State Of Art Of Acrylate Resists: An Overview Of Polymer Structure And Lithographic Performance," Optical Engineering 22(2), 222181 (1 April 1983). https://doi.org/10.1117/12.7973078 . Submission:
JOURNAL ARTICLE
4 PAGES


SHARE
RELATED CONTENT

State Of The Art Of Acrylate Resists An Overview...
Proceedings of SPIE (June 30 1982)
Resists For Storage Ring X-Ray Lithography
Proceedings of SPIE (March 19 1984)
Source of soft x rays with an x ray optical...
Proceedings of SPIE (January 21 1993)

Back to Top