The acrylate family of resists based on polymethyl methacrylate (PMMA) has paved the way for submicron lithography. The physical and chemical modifications, which have improved the performance of PMMA, are reviewed. These improvements include sensitivity to radiation (electron-beam, optical, ion, and x-ray), thermal and plasma process stability, and superior film quality. Structural modifications of the acrylate polymer chain have been the main contributors to enhanced lithographic performance.
Wayne M. Moreau,
"State Of Art Of Acrylate Resists: An Overview Of Polymer Structure And Lithographic Performance," Optical Engineering 22(2), 222181 (1 April 1983). https://doi.org/10.1117/12.7973078