1 April 1983 Shaped Beams For Integrated Circuit Fabrication
Author Affiliations +
Abstract
Numerous types of electron-beam lithography systems have been designed and built over the years. The variable shaped probe with vector deflection type has emerged as the most common of the recent designs. This architecture's popularity stems primarily from the superior writing speed for any given resolution and dose requirement by virtue of the ability to expose numerous pattern elements in parallel while at the same time retaining the flexibility of digital pattern description. High currents for rapid registration mark acquisition and relatively low circuit speed requirements are also advantages of the variable shaped spot vector deflection design.
Edward V. Weber, "Shaped Beams For Integrated Circuit Fabrication," Optical Engineering 22(2), 222190 (1 April 1983). https://doi.org/10.1117/12.7973080 . Submission:
JOURNAL ARTICLE
5 PAGES


SHARE
RELATED CONTENT

Critical review on photoresists
Proceedings of SPIE (August 06 1996)
Recent Developments In Electron Beam Lithography
Proceedings of SPIE (September 22 1987)
Recent Developments In Electron Beam Lithography
Proceedings of SPIE (August 24 1987)
Recent Developments In Electron Beam Lithography
Proceedings of SPIE (September 18 1987)
High Speed Direct Write Electron Beam System
Proceedings of SPIE (June 30 1982)

Back to Top