1 February 1984 Electron-Beam-Generated Holographic Masks For Optical Vector-Matrix Multiplication
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Abstract
A proposed optical vector-matrix multiplication scheme encodes the matrix elements as a holographic mask consisting of linear diffraction gratings. The binary, chrome-on-glass masks are fabricated by electron-beam lithography. This approach results in a fairly simple optical system that offers both large numerical range and high accuracy. Simple holographic masks have been fabricated and tested.
Steven M. Arnold, Steven K. Case, "Electron-Beam-Generated Holographic Masks For Optical Vector-Matrix Multiplication," Optical Engineering 23(1), 230179 (1 February 1984). https://doi.org/10.1117/12.7973257 . Submission:
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