1 February 1984 Electron-Beam-Generated Holographic Masks For Optical Vector-Matrix Multiplication
Author Affiliations +
Abstract
A proposed optical vector-matrix multiplication scheme encodes the matrix elements as a holographic mask consisting of linear diffraction gratings. The binary, chrome-on-glass masks are fabricated by electron-beam lithography. This approach results in a fairly simple optical system that offers both large numerical range and high accuracy. Simple holographic masks have been fabricated and tested.
Steven M. Arnold, Steven M. Arnold, Steven K. Case, Steven K. Case, "Electron-Beam-Generated Holographic Masks For Optical Vector-Matrix Multiplication," Optical Engineering 23(1), 230179 (1 February 1984). https://doi.org/10.1117/12.7973257 . Submission:
JOURNAL ARTICLE
4 PAGES


SHARE
Back to Top