1 April 1985 Photonics For Integrated Circuits And Communications
Author Affiliations +
Abstract
This paper reviews recent progress in the development of integrated optical circuits involving the GaAs/AfGaAs double heterostructure system. Devices utilizing periodic corrugations or gratings are considered briefly, whereas alternative attempts to fabricate optical circuits by chemical etching are discussed in detail. The InGaAsP/InP system is also considered. Recent advances in processing techniques for optical integration, including reactive ion etching, are described, along with recent measurements that correlate waveguide loss with epitaxial layer uniformity.
J. L. Merz, J. L. Merz, Y. R. Yuan, Y. R. Yuan, G. A. Vawter, G. A. Vawter, } "Photonics For Integrated Circuits And Communications," Optical Engineering 24(2), 242214 (1 April 1985). https://doi.org/10.1117/12.7973457 . Submission:
JOURNAL ARTICLE
6 PAGES


SHARE
RELATED CONTENT

Helmholtz beam propagation by the method of Lanczos reduction
Proceedings of SPIE (November 30 1991)
Optical coupling to monolithic integrated photonic circuits
Proceedings of SPIE (February 13 2007)
Integrated Optics: A Technology With A Future
Proceedings of SPIE (January 28 1985)

Back to Top