We report here the development of an integrated capability for writing computer-generated holograms (CGHs) using either of two commercially available electron-beam lithography systems. These binary, chrome-on-glass holograms have been used extensively for aspheric optical testing and also have applications to the interferometric recording of holograms. Algorithms are described for encoding CGHs for drawing by e-beam systems. Limitations of e-beam CGH fabrication are discussed. A self-contact lithography and ion milling process is described for con-verting chrome-on-glass holograms into 40% efficient, environmentally durable all-glass holograms.