The basic properties of the surface photodeposition effect are described. The process can be used as an imaging and optical recording method realizable with various light sources such as laser, discharge, or even conventional incandescent white light sources. Since the photo-process is controlled by the dose of light delivered to the photosystem, films of required thicknesses can be obtained in the range 50 to 2000 nm. This makes possible the preparation of various optical devices such as coatings, filters, phase retardation plates, holograms, gratings, and optical patterns for recording data. The optical resolution and contrast were tested by projection and mask contact methods. With both methods, the recorded linewidth resolution of the imaged patterns was about 1000 nm. This figure, however, was the basic resolution of the optical projection system or that of the original mask used for imaging. Theoretical arguments lead us to assume that the effect can provide better resolution due to its special feature of a one-step photographic process involving adsorption on a flat surface without a scattering emulsion on it.