1 July 1988 Capacitive Focusing Method For Microlithography
Author Affiliations +
Abstract
Focusing is a critical requirement in optical microlithography. The high resolution required calls for a large relative aperture, and this in turn shortens the depth of focus. Depth of focus on the order of the wavelength of light is a major technical problem, especially if one does not impose narrow tolerances on the flatness of the substrate. Here we report on a capacitive focusing method that makes feasible focusing accuracies to a fraction of a micrometer, automatically if desired. The theory, an implementation, and results obtained are presented.
Meir Nitzan, Meir Nitzan, Jack Broder, Jack Broder, Naftali Eisenberg, Naftali Eisenberg, Leo Levi, Leo Levi, } "Capacitive Focusing Method For Microlithography," Optical Engineering 27(7), 277512 (1 July 1988). https://doi.org/10.1117/12.7976715 . Submission:
JOURNAL ARTICLE
3 PAGES


SHARE
Back to Top