1 June 1989 Optical-Diffraction-Based Modulation Of Photoresist Profile For Microlithography Applications
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Abstract
A novel method for obtaining a tapered profile in photoresist is proposed. On the mask near the main features we add some slits smaller than the resolution limit of the projection optics at a distance also smaller than the resolution limit. In such a way, a controlled sloped profile can be obtained. We have applied this method to open tapered contacts and vias (contacts between two levels of metal) without using the thermal reflow technique of borophos-phosilicate glass, optimizing the configuration of the subresolved slits by means of a simplified mathematical model. There is experimental evidence that contacts can still be opened up to the diffraction limit of the projection optics.
Marco I. Buraschi, Laura Bacci, Giorgio De Santi, "Optical-Diffraction-Based Modulation Of Photoresist Profile For Microlithography Applications," Optical Engineering 28(6), 286654 (1 June 1989). https://doi.org/10.1117/12.7977016 . Submission:
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