1 June 1990 Semitransparent soft x-ray multilayer mirrors
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Abstract
We report on the conception, fabrication, and characterization of a multilayer beamsplitter for use at oblique incidence in the soft x-ray range. Thin film deposition, conventional patterning, and anisotropic etch techniques are used to produce the self-supporting silicon carbide carrier film. Large-area Mo/C multilayer beamsplitters (1 cm2 ) were fabricated. Experimental results on the reflection and transmission at 1.33 nm are presented and compared with theoretical calculations. The role of the supporting film and the flatness of the structure are addressed. Our process is compared with existing approaches from the literature.
Chantal G. Khan Malek, Jean Susini, A. Madouri, M. Ouahabi, Jean-Rene Rivoira, F. R. Ladan, Yves Lepetre, Robert J. Barchewitz, "Semitransparent soft x-ray multilayer mirrors," Optical Engineering 29(6), (1 June 1990). https://doi.org/10.1117/12.55634
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