1 July 1990 Design and analysis of a Schwarzschild imaging multilayer x-ray microscope
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Abstract
Normal incidence multilayer x-ray mirror technology has now advanced to the point that high resolution x-ray microscopes with relatively large fields of view are feasible. High resolution aplanatic imaging x-ray microscopes configured from low x-ray scatter normal incidence multilayer optics should be ideal for laser fusion research, biological investigations, and astronomical studies when used in conjunction with grazing incidence or multilayer x-ray telescope systems. We have designed several Schwarzschild x-ray microscope optics. Diffraction analysis indicates that better than 600 Å spatial resolution in the object plane up to a 0.7 mm field of view can be achieved with 100 Å radiation. We are currently fabricating a 20 x normal incidence multilayer x-ray microscope of 1.35 m overall length. We have also analyzed and designed other microscope systems for use in conjunction with x-ray telescopes. This paper reports on the results of these studies and the x-ray microscope fabrication effort.
David L. Shealy, David L. Shealy, Richard B. Hoover, Richard B. Hoover, Troy W. Barbee, Troy W. Barbee, Arthur B. C. Walker, Arthur B. C. Walker, "Design and analysis of a Schwarzschild imaging multilayer x-ray microscope," Optical Engineering 29(7), (1 July 1990). https://doi.org/10.1117/12.55656 . Submission:
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